DOIT: Development of an optimized integrated thin film silicon solar module

• Forschungsstelle: EU FRP
• Projektnummer: 00.0337
• Projekttitel Englisch: DOIT: Development of an optimized integrated thin film silicon solar module

Schlüsselwörter (Englisch)

Thin-film silicon; solar cells; solar modules; plasma deposition; TCO; modelling; module integration;
Economic Aspects; Energy Saving; Renewable Sources of Energy

Alternative Projektnummern (Englisch)

EU project number: ENK6-2000-00321

Forschungsprogramme (Englisch)

EU-programme: 5. Frame Research Programme - 1.4b.2 Economic and efficient energy for a competitive Europe

Kurzbeschreibung (Englisch)

See abstract

Partner und Internationale Organisationen (Englisch)

Coordinator: University of Patras, Research Committee (EL)

Abstract (Englisch)

This project aims at the development of an innovative silicon thin film solar module, exhibiting a stabilised active area efficiency of 11% on a substrate size of 30x30 cm2. The device consists of an amorphous silicon/microcrystalline silicon tandem solar cell (micromorph cell) prepared on a low cost TCO coated glass substrate. In view of industrial production, a deposition rate of at least4 angstrom/s will be achieved for the intrinsic layer of the c-Si:H bottom cell. Besides the scale-up of state-of-the-art small area micromorph cells prepared by Very High Frequency Glow Discharge, an alternative approach will be followed using lower excitation frequencies, which are more compatible with current a-Si:H production technology. The developments include the module fabrication technology and efficient light trapping schemes. Appropriate characterisation techniques and implementation of advanced plasma control tools will ensure a successful scale-up.

Datenbankreferenzen (Englisch)

Swiss Database: Euro-DB of the
State Secretariat for Education and Research
Hallwylstrasse 4
CH-3003 Berne, Switzerland
Tel. [phone]
Swiss Project-Number: 00.0337