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Research unit
INNOSUISSE
Project number
13271.1;8 PFIW-IW
Project title
A new low ion energy bombardment PECVD reactor for the deposition of thin film silicon for solar cell applications
Project status Finished
 
Start date 01.01.2012
End date 02.07.2013
 
Granted total costs 112'029.00  CHF
Section 23 Förderbereich Engineering
Project category Project
Research type Applied research and development
NABS classification Non divisible / inclassable research
 
Research disciplines
100 % T130 Production technology
Last modification of the project
27.11.2014