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Research unit
INNOSUISSE
Project number
8587.1;6 EPRP-IW
Project title
Optimization of the plasma enhanced chemical vapor (PECVD) process for the deposition of SiOx barrier coatings on polymers
Project status Finished
 
Start date 01.02.2007
End date 18.10.2010
 
Granted total costs 240'000.00  CHF
Section 23 Förderbereich Engineering
Project category Project
Research type Applied research and development
NABS classification Non divisible / inclassable research
 
Research disciplines
100 % T130 Production technology
Last modification of the project
27.11.2014