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Research unit
INNOSUISSE
Project number
6947.1;6 EPRP-IW
Project title
A new large area very high frequency (VHF) reactor for the high rate deposition of microcrystalline silicon for thin film solar cell applications
Project status Finished
 
Start date 01.05.2004
End date 26.10.2007
 
Granted total costs 349'980.00  CHF
Section 23 Förderbereich Engineering
Project category Project
Research type Applied research and development
NABS classification Industrial production and technology
 
Research disciplines
100 % T130 Production technology
Last modification of the project
27.11.2014