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Research unit
INNOSUISSE
Project number
9896.2;4 PFIW-IW
Project title
Very fast SiOx barrier deposition on polymers by plasma enhanced chemical vapor (PECVD) process with a helicon plasma source

Participants

Research organisation: Innosuisse
Swiss Innovation Agency
Einsteinstrasse 2
CH-3003 Bern
+41 58 461 61 61 (Call Center)
info@innosuisse.ch
www.innosuisse.ch/
Contact person

 Dr.
Christoph Hollenstein
EPFL
Station 13
CH-1015 Lausanne
021 693 34 71
christophe.hollenstein@epfl.ch